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|Paper IPM / Physic / 12148||
Ni-Cu NPs @ a-C:H thin films with different concentration of Cu content were prepared by co-deposition of RF-sputtering and RF-Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) from acetylene gas and Cu and Ni targets. The prepared samples were used as catalysts for growth of carbon nanotubes (CNTs) from liquid petroleum gas (LPG) at 825 ?C by Thermal Chemical Vapor Deposition (TCVD). Catalyst layer were characterized by RBS, AFM, UV-Visible. The results indicate that the growth rate of CNTs is improved by adding Cu@ a:C:H under layer to Ni NPs and Cu content of under layer dictate morphology of surface of catalyst layer and consequently dictate average sizes of grown CNTs. Furthermore optical and electrical properties of catalyst layer explain effect Cu NPs @ a-C:H under layer on catalyst properties of Ni NPs. Therefore CNTs growth can be manipulated by the selection suitable Cu NPs @ a-C:H under layer.
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