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Paper IPM / Physic / 14598 |
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A key step in industrialization of photovoltaics (PV) is the development of low-cost and large-area metallization processes to substitute the standard screen-printing process of silver paste. Thus Cu and Ni metallization processes enabled by laser patterning have been widely pursued in passivated-emitter and rear-cell (PERC) technology. However, the undesirable opto-thermal side-effects of laser processing have so far hindered using similar processes for metallization of Si heterojunction (SHJ) solar cells due to the relatively high sensitivity of SHJ cells to thermal shocks. Here an innovative process is described, in which the laser damage to SHJ cell is minimized by using a double-mask layer that optically and thermally isolates the device from the laser beam. As a proof of concept, Si heterojunction solar cells of 235 cm² surface area are metallized using this method and > 19
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